Radiation-sensitive polymer and radiation-sensitive composition

Details Radiation-sensitive polymer and radiation-sensitive composition Radiation-sensitive polymer and radiation-sensitive composition

1990-07-09

1992-03-31

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

526240, 526241, 556 94, G03C 1492

Patent

active

051007622

ABSTRACT:
A radiation-sensitive polymer is capable of resistance to the dry etching when it is applied to form very fine patterns in VLSIs and other semiconductor devices, wherein the polymer is a radiation-sensitive polymer that contains at least one unit represented by the general formula (I): ##STR1## (where X is an alkyl group, a halogen atom or a halogenated alkyl group; R.sup.1 is an alkyl group, an alkoxy or an aryl group; R.sup.2 is carbon monoxide; M is Si, Ge, Sn, Ti, Mo or W; k is a number defined by the valence of (M minus 1); and l is zero or a positive integer), and which optionally contains at least one unit represented by the general formula (II): ##STR2## (where Y is an alkyl group, a halogen atom or a halogenated alkyl group; R.sup.3 is an alkyl group or an aryl group) and/or at least one unit represented by the general formula (III):

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Ito et al., J. Electrochem. Soc., Solid State Sci and Tech., 135(9), 2322-2327.
Labadie et al., Macromolecules 1987 (20), 10-15.

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