Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1986-08-13
1989-04-18
Michl, Paul R.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430192, 430196, 430175, 430326, G03C 1495
Patent
active
048227196
ABSTRACT:
A radiation-sensitive mixture which contains
REFERENCES:
patent: 3409589 (1968-11-01), Kine
patent: 3869292 (1975-03-01), Peters
patent: 4025710 (1977-05-01), Stolka et al.
patent: 4263394 (1981-04-01), Gates et al.
patent: 4384037 (1983-05-01), Hosaka et al.
patent: 4421844 (1983-12-01), Buhr et al.
patent: 4439516 (1984-03-01), Cernigliaro et al.
patent: 4458000 (1984-07-01), Stahlholfen
patent: 4467027 (1984-08-01), Yamamoto et al.
patent: 4506003 (1985-03-01), Ruckert et al.
patent: 4506006 (1985-03-01), Ruckert
patent: 4572887 (1986-02-01), Geissler
patent: 4678737 (1987-07-01), Schneller et al.
patent: 4699867 (1987-10-01), Schneller et al.
Julius Grant, ed, Hackh's Chemical Dictionary, 3rd ed., McGraw-Hill Book Company, Inc., New York, N.Y., 1944, p. 33.
Erbes Kurt
Sander Ju
Schneller Arnold
Schulze Ralf
Hamilton Cynthia
Hoechst Aktiengesellschaft
Michl Paul R.
LandOfFree
Radiation-sensitive mixture, radiation-sensitive recording mater does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Radiation-sensitive mixture, radiation-sensitive recording mater, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Radiation-sensitive mixture, radiation-sensitive recording mater will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2396634