Radiation-sensitive mixture for photosensitive coating materials

Details Radiation-sensitive mixture for photosensitive coating materials Radiation-sensitive mixture for photosensitive coating materials

1989-04-14

1991-11-12

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430326, 430330, 430910, 430921, 430922, 430296, 430942, G03C 1495, G03C 500

Patent

active

050647466

ABSTRACT:
The radiation-sensitive mixture contains

REFERENCES:
patent: 3923514 (1975-12-01), Marsh
patent: 4491628 (1985-01-01), Ito et al.
patent: 4576902 (1986-03-01), Saenger et al.
patent: 4666820 (1987-05-01), Chandross et al.
patent: 4678737 (1987-07-01), Schneller et al.
patent: 4689288 (1987-08-01), Buiguez et al.
patent: 4770977 (1988-09-01), Buiguez et al.
patent: 4812542 (1989-03-01), Schwalm et al.
patent: 4883740 (1989-11-01), Schwalm et al.
Novolac Resins Used in Positive Resist Systems, Pampalone, Solid State Technology, Jun. 1984, pp. 115-120.
Applications of Photoinitiated Cationic Polymerization . . . , Crivello, Polym. Sci. 48 (1985), pp. 65-60.
Journal of Imaging Technology, vol. 11, No. 4, Aug. 1985 pp. 146-157.

Affiliated with

Also associated with

Rating

Radiation-sensitive mixture for photosensitive coating materials does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Radiation-sensitive mixture for photosensitive coating materials, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Radiation-sensitive mixture for photosensitive coating materials will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1012689