Radiation-sensitive mixture for photosensitive coating materials

Details Radiation-sensitive mixture for photosensitive coating materials Radiation-sensitive mixture for photosensitive coating materials

1988-06-30

1989-11-28

Michl, Paul R.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430910, 430905, 430914, 430921, 430326, 430330, 522 25, 522 31, G03C 1495, G03C 516, G03C 500

Patent

active

048837407

ABSTRACT:
A radiation-sensitive mixture consists of a polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions, and of an organic compound whose solubility in an aqueous alkaline developer is increased by the action of an acid and which contains both one or more acid-cleavable groups and a group which forms a strong acid under the action of radiation.
The radiation-sensitive mixture is suitable for use in photosensitive coating materials for the production of relief patterns and relief images.

REFERENCES:
patent: 3915706 (1975-10-01), Limburg et al.
patent: 4058400 (1977-11-01), Crivello
patent: 4210449 (1980-07-01), Schlesinger et al.
patent: 4491628 (1985-01-01), Ito et al.
patent: 4678737 (1987-07-01), Schneller et al.
patent: 4689288 (1987-08-01), Buiguez et al.
Highly-Sensitive Novolak-Based Positive X-Ray Resist, Dossell et al. Microcircuit Engineering, Interlaken 1986.
Applications of Photoinitiated Cationic Polymerization Toward the Development of New Photoresist, Crivello, Polym. Sci., 48,5.65-69 (1985).
M. T. Goosey, Elsevier Appl. Sci. Pub., London, S. 218-221 (1985).
Photoinitiated Cationic Polymerization by Dialkyl-4-Hydroxyphenylsulfonium Salts, Crivello et al., Journal of Polymer Science: Polymer Chemistry Ed. vol. 18 1021-1034 (1980).

Affiliated with

Also associated with

Rating

Radiation-sensitive mixture for photosensitive coating materials does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Radiation-sensitive mixture for photosensitive coating materials, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Radiation-sensitive mixture for photosensitive coating materials will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-581406