Radiation-sensitive mixture containing acid labile groups and pr

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

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430176, 430192, 430921, 430914, 430910, 430905, 430330, 430296, 430325, 430967, 522 31, 522 32, G03F 7039, G03F 7075, G03F 730, G03F 740

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050734741

ABSTRACT:
A radiation sensitive mixture suitable for producing relief patterns contains

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Pampalone, "Solid State Technology", (Novolak Resins Used in Positive Resist Systems) Jun. 1984, pp. 115-120.
S. Peter Papos, Journal of Imaging Technology, vol. 11, No. 4, Aug. 1985, pp. 146-157.

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