Radiation-sensitive mixture containing acid-labile groups and pr

Details Radiation-sensitive mixture containing acid-labile groups and pr Radiation-sensitive mixture containing acid-labile groups and pr

1992-04-03

1994-06-07

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430326, 430914, 430921, 522 59, 522 31, G03G 173, G03G 556, G03F 7039

Patent

active

053188764

ABSTRACT:
A radiation-sensitive mixture which contains

REFERENCES:
patent: 3915706 (1975-10-01), Limburg et al.
patent: 3923514 (1975-12-01), Marsh
patent: 4678737 (1987-07-01), Schneller et al.
patent: 4883740 (1989-11-01), Schwalm et al.
patent: 5069998 (1991-12-01), Schwalm et al.
patent: 5118582 (1992-06-01), Ueno et al.
Microelectronic Engineering, Bd. 13, No. 1/4, Mar. 1991, pp. 33-36, Schlegel et al.: "Highly Sensitive Positive Deep UV Resist Utilizing a Sulfonate Acid Generator and a Tetrahydropyranyl Inhibitor" (to be submitted later).
SPIE, vol. 1262, Advances in Resist Technology and Processing VII (1990) pp. 26-31.
J. Polymer Sci., Chem. Edition, vol. 18, pp. 1021-1034 (1980).

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