Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2008-01-01
2008-01-01
Walke, Amanda C. (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S945000, C430S281100, C430S905000, C430S913000, C430S915000
Reexamination Certificate
active
07314699
ABSTRACT:
The present invention relates to a radiation-sensitive mixture which contains an acrylate or methacrylate monomer and/or oligomer capable of free radical polymerization and having at least two acrylate and/or methacrylate groups and at least one photooxidizable group, a photoinitiator, an organic polymeric binder and a heptamethinecyanine dye acting as an IR-absorbing dye. It furthermore relates to a recording material comprising a substrate and a photopolymerizable layer and a process for the production of a printing plate from this recording material. The recording material is distinguished by suitable photosensitivity.
REFERENCES:
patent: 5494777 (1996-02-01), Shiraki et al.
patent: 0 315 988 (1989-05-01), None
patent: 0 369 645 (1990-05-01), None
patent: 0 441 542 (1991-08-01), None
patent: 0 563 925 (1993-10-01), None
patent: 1 106 381 (2001-06-01), None
patent: 1 162 078 (2001-12-01), None
patent: 1 176 007 (2002-01-01), None
patent: 1 203 660 (2002-05-01), None
patent: 1 223 196 (2002-07-01), None
patent: 2002166669 (2002-06-01), None
patent: 2002202592 (2002-07-01), None
English language abstract of JP 2002-16669.
English language abstract of JP 2002-202592.
Search Report for EP 02 10 0424 (Sep. 27, 2002).
Agfa Graphics NV
Leydig , Voit & Mayer, Ltd.
Walke Amanda C.
LandOfFree
Radiation-sensitive mixture and recording material produced... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Radiation-sensitive mixture and recording material produced..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Radiation-sensitive mixture and recording material produced... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2772296