Radiation sensitive mixture and production of relief patterns

Details Radiation sensitive mixture and production of relief patterns Radiation sensitive mixture and production of relief patterns

1989-05-16

1991-12-03

Hamilton, Cynthia

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430921, 430910, 522 31, G03F 7039

Patent

active

050699989

ABSTRACT:
A radiation sensitive mixture useful for producing relief patterns contains

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patent: 4506006 (1985-03-01), Ruckert
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patent: 4820607 (1989-04-01), Aoai
patent: 4883740 (1989-11-01), Schwalm et al.
Research Disclosure, No. 273, Jan. 1987, p. 24.
Microelectronic Engineering, vol. 6, Nos. 1-4, Dec. 1987, pp. 503-506.
Journal of Imaging Technology, vol. 11, No. 4, Aug. 1985, pp. 146-157.
Applications of Photoinitiated Cationic Polymerization Toward the Development of New Photoresists-Crivello-Appl. Polym. Sci., 48, pp. 65-69 (1985).
Photoinitiated Cationic Polymerization by Dialkyl-4-Hydroxyphenylsulfonium Salts-Crivello et al.-J. Polymer Science; vol. 18, 1021-1034 (1980).

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