Radiation sensitive mixture and production of relief patterns

Details Radiation sensitive mixture and production of relief patterns Radiation sensitive mixture and production of relief patterns

1989-05-16

1991-12-24

Hamilton, Cynthia

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430270, 430325, 430326, 522 31, G03F 7038, G03F 7039, G03F 730, G03F 740

Patent

active

050751999

ABSTRACT:
A radiation sensitive mixture useful for producing relief patterns contains

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patent: 4770977 (1988-09-01), Buiguez et al.
patent: 4820607 (1989-04-01), Aoai
W. S. DeForest, Photo Resist: Materials and Processes, (McGraw-Hill Book Company, New York, N.Y., 1975), pp. 213, 229-232.
Crivello, "Org. Coatings and Appl. Polym. Sci.", 48, pp. 65-69 (1985).
Stabb, "Angewandte Chemie, 12", pp. 407-423 (1962).
Pampalone, "Solid State Technology", Novolac Resins Used in Positive Resist Systems, Jun. 1984, pp. 115-120.
Journal of Imaging Technology, vol. 11, No. 4, Aug. 1985, pp. 146-157.

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