Radiation-sensitive mixture and process for the production of re

Details Radiation-sensitive mixture and process for the production of re Radiation-sensitive mixture and process for the production of re

1980-07-15

1982-01-19

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430271, 430278, 430300, 430322, 430306, 20415914, G03C 168, G03C 500

Patent

active

043117821

ABSTRACT:
A radiation-sensitive mixture is described which contains (a) a compound which forms an acid under the action of actinic radiation, and (b) a polymeric compound having recurrent orthocarboxylic acid ester groupings, and which comprises a polymeric compound which is built up from recurrent units of the formula I: ##STR1## wherein R.sup.1 is a hydrogen atom or an alkyl, cycloalkyl or aryl group, R.sup.2, R.sup.3 and R.sup.5 are identical or different and denote hydrogen atoms or alkyl or aryl groups, R.sup.4 denotes an alkylene group or --if a.sub.1 =a.sub.2 =1-- also an alkyleneoxy group, it being possible for the alkylene groups to be interrupted by hetero-atoms or by unsaturated or cyclic groups, R.sup.6 denotes a hydrogen atom or a methyl group, a.sub.1 and a.sub.2 each denote, 0, 1 or 2, a.sub.1 +a.sub.2 denotes 1 or 2 and m denotes a number from 3 to 200. The mixtures are suitable for the production of reprographic materials, in particular printing plates, of high photosensitivity.

REFERENCES:
patent: 4066747 (1978-01-01), Capozza
patent: 4101323 (1978-07-01), Buhr et al.
patent: 4119579 (1978-10-01), Capozza

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