Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1995-12-05
1998-01-06
Chu, John S.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430170, 430175, 430192, 430326, G03F 7004
Patent
active
057053170
ABSTRACT:
A radiation-sensitive mixture which contains (a) a compound of the formula (I) ##STR1## where R.sup.1 is an optionally substituted alkyl radical, R.sup.2 is a hydrogen atom or an optionally substituted alkyl radical containing 1 to 4 carbon atoms, R.sup.3 is an n-valent, optionally polymeric aliphatic or aromatic radical and n is a number from 1 to 100; and b) a compound which forms a strong acid on exposure to actinic radiation.
REFERENCES:
patent: 2956884 (1960-10-01), Caldwell
patent: 3779778 (1973-12-01), Smith et al.
patent: 4101323 (1978-07-01), Buhr et al.
patent: 4247611 (1981-01-01), Sander et al.
patent: 4311782 (1982-01-01), Buhr et al.
patent: 4491628 (1985-01-01), Ito et al.
patent: 4837124 (1989-06-01), Wu et al.
patent: 5015558 (1991-05-01), Ochi et al.
patent: 5034305 (1991-07-01), Nguyen-Kim et al.
patent: 5066572 (1991-11-01), O'Connor et al.
patent: 5120629 (1992-06-01), Bauer et al.
patent: 5133894 (1992-07-01), Gethoffer et al.
patent: 5175348 (1992-12-01), Gallegra et al.
patent: 5231221 (1993-07-01), Hertzsch et al.
patent: 5248558 (1993-09-01), Bagchi et al.
patent: 5314785 (1994-05-01), Vogel et al.
patent: 5318876 (1994-06-01), Schwalm et al.
patent: 5340676 (1994-08-01), Anderson et al.
patent: 5354643 (1994-10-01), Cabrera et al.
patent: 5356752 (1994-10-01), Cabrera et al.
patent: 5374498 (1994-12-01), Fujita et al.
patent: 5389494 (1995-02-01), Kim
patent: 5532106 (1996-07-01), Frechet et al.
Ban et al., "Metal-free chemically amplified positive resist resolving 0.2 micron in x-ray litography".
Buhr Gerhard
Eichhorn Mathias
Agfa-Gevaert AG
Chu John S.
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