Radiation-sensitive mixture

Details Radiation-sensitive mixture Radiation-sensitive mixture

1988-11-01

1990-08-07

Michl, Paul R.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430300, 430302, 430344, 430914, 430919, 430925, 522109, 522110, 522134, 522136, G03C 504

Patent

active

049467603

ABSTRACT:
A radiation-sensitive mixture, in particular photosensitive mixture, is disclosed that contains a compound which forms a strong acid on exposure to actinic radiation and a polymeric reaction product of (i) a polymeric organic compound containing free OH groups, (ii) an organic compound containing at least two isocyanate groups or at least two epoxy groups, and (iii) a compound containing repeating acid-cleavable acetal or ketal groups and at least one free OH group. The mixture yields printing plates or photoresists with a longer storage life.

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