Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1989-10-17
1991-07-23
McCamish, Marion E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430326, 430330, 430272, G03C 172
Patent
active
050343050
ABSTRACT:
The invention relates to a radiation-sensitive mixture essentially consisting of
REFERENCES:
patent: 3915706 (1975-10-01), Limburg et al.
patent: 4284706 (1981-08-01), Clecak et al.
patent: 4311782 (1982-01-01), Buhr et al.
patent: 4491628 (1985-01-01), Ito et al.
patent: 4624908 (1986-11-01), Schwartzkopf
patent: 4678737 (1987-07-01), Schneller et al.
patent: 4689288 (1987-08-01), Buiguez et al.
patent: 4737426 (1988-04-01), Roth
patent: 4770977 (1988-09-01), Buiguez et al.
patent: 4808512 (1989-02-01), Schwartzkopf
patent: 4877719 (1989-10-01), Hagashi et al.
Applications of Photoinitiated Cationic Polymerization Toward the Development of New Photoresists, Crivello, Polym. Sci., 48, pp. 65-69 (1985).
J. Polym. Sci., Part A, Chem. Ed., vol. 24, 2971-1980 (1986).
Binder Horst
Hoffmann Gerhard
Nguyen-Kim Son
Schwalm Reinhold
BASF - Aktiengesellschaft
McCamish Marion E.
Rodee Christopher D.
LandOfFree
Radiation-sensitive mixture does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Radiation-sensitive mixture, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Radiation-sensitive mixture will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-431944