Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1989-02-24
1991-02-26
McCamish, Marion C.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
430326, 430270, 430945, G03C 558
Patent
active
049961365
ABSTRACT:
Sensitive deep ultraviolet resists are formed utilizing a material that undergoes decomposition to form an acid together with a polymer including a chain scission inducing monomer such as sulfonyl units and substituent that undergoes reaction to form an acidic moiety when subjected to the photogenerated species. An exemplary composition includes poly(t-butoxycarbonyloxystyrenesulfone) and 2,6-dinitrobenzyl-p-toluene sulfonate. The sulfonate decomposes to form sulfonic acid upon irradiation. This acid reacts with the polymer group to form an acid functionality while the sulfone moiety of the polymer induces scission. As a result, the irradiated portions of the resist material are soluble in ionic solvents while the unirradiated portions are not.
REFERENCES:
patent: 4491628 (1985-01-01), Ito et al.
patent: 4552833 (1985-11-01), Ito et al.
patent: 4808511 (1989-02-01), Holmes
patent: 4810613 (1989-03-01), Osuch et al.
patent: 4889191 (1989-12-01), Tsuchiya et al.
patent: 4931379 (1990-06-01), Brunsvold et al.
patent: 4939070 (1990-07-01), Brunsvold et al.
Macromolecules; vol. 21, No. 7; Jul. 1988; F. M. Houlihan et al.; pp. 2001-2006; Nitrobenzyl Ester Chemistry.
B. J. Lin, Journal of Vacuum Science and Technology, 12, 1317 (1975).
M. J. Bowden, Materials for Microlithography, ed. L. F. Thompson, et al., ACS Symposium Series, No. 266, American Chemical Society, Washington, D.C., 1984, p. 49.
Billmeyer, Textbook of Polymer Science, p. 6, 1971, J. Wiley & Sons.
G. Odian, Principles of Polymerization, Wiley-Interscience, p. 268 (1981).
Introduction to Microlithography, eds. L. F. Thompson, C. G. Willson and M. J. Bowden, ACS Symposium, Series 219, pp. 16-82 (1983).
Houlihan Francis M.
Reichmanis Elsa
Thompson Larry F.
AT&T Bell Laboratories
McCamish Marion C.
Rodee Christopher D.
Schneider B. S.
LandOfFree
Radiation sensitive materials and devices made therewith does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Radiation sensitive materials and devices made therewith, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Radiation sensitive materials and devices made therewith will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-293613