Radiation-sensitive high-polymeric material

Details Radiation-sensitive high-polymeric material Radiation-sensitive high-polymeric material

1987-08-31

1989-08-08

Michl, Paul R.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430270, 430296, 430326, 430942, G03C 1495, G03C 168

Patent

active

048552143

ABSTRACT:
There is disclosed a radiation sensitive high polymeric material which is used, for example, for making a photo-mask which is comprising polymethyl methacrylate having an average molecular weight which is in a range from 600,000 to 1,500,000 and a tetraalkylammonium perchlorate as an orientation inhibitor wherein said polymethyl methacrylate and tetraalkylammonium perchlorate are dissolved in an acetic cellosolve as a solvent.

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