Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1998-10-26
2000-03-28
Lipman, Bernard
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
526266, 526270, 526279, G03C 172
Patent
active
060429895
ABSTRACT:
A radiation sensitive composition comprising (a) a terpolymer containing 20 to 70 mole percent of an acid-labile repeating unit, 3 to 40 mole percent of an acrylic or acrylonitrile based repeating unit and a repeating unit containing silicon side-chains and (b) a photo-acid generator. The silicon content of terpolymer is 7 to 20 weight percent. The composition is used primarily in the formulation of multilayer positive operating photoresists.
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patent: 5552260 (1996-09-01), Vogel et al.
patent: 5886119 (1999-03-01), Schaedeli et al.
Falcigno Pasquale Alfred
Hofmann Manfred
Mertesdorf Carl-Lorenz
Schaedeli Ulrich
Tinguely Eric
Egwim Kelechi
Lipman Bernard
Olin Microelectronic Chemicals, Inc.
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