Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1991-09-23
1993-11-02
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430193, 430313, 430905, 430909, G03C 154, G03C 558
Patent
active
052582574
ABSTRACT:
The invention provides a radiation sensitive composition having a polymer binder of phenolic and cyclic alcohol units. At least a portion of the phenolic units and/or cyclic alcohol units of the polymer are bonded to acid labile groups. High solubility differentials between exposed and unexposed regions are realized with only moderate substitution of the binder with the acid labile groups.
REFERENCES:
patent: 4491628 (1985-01-01), Ito et al.
patent: 4810613 (1989-03-01), Osuch et al.
patent: 4883740 (1989-11-01), Schwalm et al.
patent: 4931379 (1990-06-01), Brunsvold et al.
patent: 4939070 (1990-07-01), Brunsvold et al.
patent: 4948697 (1990-08-01), Durham
patent: 4968581 (1990-11-01), Wu et al.
patent: 4996136 (1991-02-01), Houlihan et al.
patent: 5075199 (1991-12-01), Schwalm et al.
patent: 5128232 (1992-07-01), Thackeray et al.
Y. Onishi, et al., Journal of Photopolymer Science and Technology, vol. 4, No. 3, pp. 337-340 (1991).
Canistro Dianne
Hemond Richard C.
Medeiros David R.
Rajaratnam Martha M.
Sinta Roger
Bowers Jr. Charles L.
Corless Peter F.
Goldberg Robert L.
Huff Mark F.
Shipley Company Inc.
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