Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2006-12-26
2006-12-26
Schilling, Richard L. (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S281100, C430S283100, C430S302000, C430S905000, C430S910000
Reexamination Certificate
active
07153632
ABSTRACT:
A radiation-sensitive composition includes a radically polymerizable component that comprises carboxy groups, an initiator composition to generate radicals, and a polymeric binder comprising poly(alkylene oxide) segments and optionally pendant cyano groups. This composition can be used to prepare imageable elements such as negative-working, on-press developable printing plate precursors.
REFERENCES:
patent: 4228232 (1980-10-01), Rousseau
patent: 5919600 (1999-07-01), Huang et al.
patent: 6582882 (2003-06-01), Pappas et al.
patent: 6730457 (2004-05-01), Saraiya et al.
patent: 6899944 (2005-05-01), Tanaka et al.
patent: 2003/0064318 (2003-04-01), Huang et al.
patent: 2004/0260050 (2004-12-01), Munnelly et al.
patent: 2005/0003285 (2005-01-01), Hayashi et al.
patent: WO 2004/101280 (2004-11-01), None
Mikell Frederic E.
Munnelly Heidi M.
Saraiya Shashikant
Wieland Kevin D.
Eastman Kodak Company
Schilling Richard L.
Tucker J. Lanny
LandOfFree
Radiation-sensitive compositions and imageable materials does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Radiation-sensitive compositions and imageable materials, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Radiation-sensitive compositions and imageable materials will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3719441