Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1992-04-02
1993-11-16
Berman, Susan
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
430315, 430280, G03C 173, G03C 516
Patent
active
052622800
ABSTRACT:
Radiation sensitive compositions, processes for using the compositions, and articles of manufacture comprising the compositions. The photoimageable compositions of the invention comprises a radiation sensitive component, a resin binder and a polybutadiene that comprises one or more internal epoxide groups. In preferred aspects, the compositions of the invention further comprise a crosslinking agent such as a melamine or an epoxidized material, or mixtures thereof.
REFERENCES:
patent: 3877941 (1975-04-01), Lohmann
patent: 4035189 (1977-07-01), Hayashi et al.
patent: 4405707 (1983-09-01), Bierhenke et al.
patent: 4579885 (1986-04-01), Domeier et al.
patent: 4628022 (1986-12-01), Ors et al.
patent: 4760106 (1988-07-01), Gardner et al.
patent: 4902610 (1990-02-01), Shipley
patent: 4987264 (1991-01-01), Holoch et al.
Chemical and Engineering News, pp. 24-25 (Apr. 29, 1991).
J. Cameron et al, J. Am. Chem. Soc., vol. 113, No. 11, 4303-4313 (1991).
J. Cameron et al, J. Org. Chem., 55, 5919-5922 (1990).
M. Winkle et al, Journal of Photopolymer Science and Technology, vol. 3, No. 3, 419-422 (1990).
C. Kutal et al, Journal of Coatings Technology, vol. 62, No. 786, 63-67 (Jul. 1990).
H. Stenzenberger, British Polymer Journal, 20, 383-396 (1988).
R. Cummings et al, Tetr. Letters, vol. 29, No. 1, 65-68 (1988).
I. Varma, polymer News, vol. 12, No. 10, 294-306 (1987).
B. Amit, J. Org. Chem., vol. 39, No. 2, 192-196 (1974).
A. Patchorik et al., J. Am. Chem. Soc., 92:21, 6333-6334 (1970).
J. Barltrop et al, J. Chem. Soc. Chem. Comm., 822-823 (1966).
Kutal et al, Proc. Polym. Mat. Sci. Eng., 61, 195-198 (1989).
Frechet et al, J. Polym. Mat. Sci. Eng., 64, 55-56 (Spring 1991).
Kutal et al, J. Electrochem. Soc., vol. 134, No. 9, 2280-2285 (1987).
Beecher et al, J. Poly. Mater. Sci. Eng., 64, 71-72 (1991).
Knudsen Philip D.
Pai Daniel Y.
Shipley Charles R.
Berman Susan
Corless Peter F.
Goldberg Robert L.
Shipley Company Inc.
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