Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1996-11-21
1999-02-02
McPherson, John A.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
4302701, 430916, 430 7, G03F 7031, G02B 520
Patent
active
058662987
ABSTRACT:
A radiation sensitive composition for color filters comprising (A) a colorant, (B) a binder polymer, (C) a poly-functional monomer, (D) a photopolymerization initiator containing at least one biimidazole compound typified by 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetrakis(4-ethoxycarbonylphenyl)-biimid azole and 2,2'-bis(2,4-dichlorophenyl)-4,4',5,5'-tetraphenylbiimidazole, and (E) a solvent. The composition can be used for the manufacture of color filters exhibiting excellent photographic sensitivity and superior contrast, while effectively controlling production of residual insoluble material during development process.
REFERENCES:
patent: 3652275 (1972-03-01), Baum et al.
patent: 3784557 (1974-01-01), Cescon
patent: 4090877 (1978-05-01), Streeper
patent: 5362603 (1994-11-01), Katoh et al.
Bessho Nobuo
Iwamoto Satoshi
Nemoto Hiroaki
Wanibe Yasumi
Japan Synthetic Rubber Co. Ltd.
McPherson John A.
LandOfFree
Radiation sensitive composition for color filters does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Radiation sensitive composition for color filters, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Radiation sensitive composition for color filters will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1115750