Radiation sensitive composition comprising polymer having inert

Details Radiation sensitive composition comprising polymer having inert Radiation sensitive composition comprising polymer having inert

1995-03-16

1996-05-07

Hamilton, Cynthia

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430192, 430905, 522126, G03F 7038

Patent

active

055145205

ABSTRACT:
A photoresist composition consisting of an acid or base generator, a crosslinking agent activated in the presence of an acid or base and an alkali soluble resin, preferably a phenolic resin, having a portion of its phenolic hydroxyl groups reacted to form a blocking group inert to acid or base. The presence of the inert blocking group enables development of an exposed photoresist with a strong developer without formation of microbridges between fine line features.

REFERENCES:
patent: 4564575 (1986-01-01), Perreault et al.
patent: 5128232 (1992-07-01), Thackeray et al.
patent: 5204218 (1993-04-01), Kumada et al.
patent: 5362600 (1994-11-01), Sinta et al.

Affiliated with

Also associated with

Rating

Radiation sensitive composition comprising polymer having inert does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Radiation sensitive composition comprising polymer having inert , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Radiation sensitive composition comprising polymer having inert will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1226268