Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2006-09-19
2006-09-19
Walke, Amanda (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S280100, C430S281100, C430S311000
Reexamination Certificate
active
07108954
ABSTRACT:
A radiation sensitive refractive index changing composition comprising (A) a decomposable compound, (B) a non-decomposable compound having a higher refractive index than the decomposable compound (A), (C) a radiation sensitive decomposer and (D) a stabilizer. By exposing this composition to radiation through a pattern mask, the above components (C) and (A) of an exposed portion decompose to create a refractive index difference between the exposed portion and an unexposed portion, thereby forming a pattern having different refractive indices.
REFERENCES:
patent: 3894253 (1975-07-01), Willyoung et al.
patent: 3940507 (1976-02-01), Fech, Jr. et al.
patent: 4168274 (1979-09-01), Hildon et al.
patent: 4247611 (1981-01-01), Sander et al.
patent: 5627010 (1997-05-01), Pai et al.
patent: 5635338 (1997-06-01), Joshi et al.
patent: 5958648 (1999-09-01), Nishimura et al.
patent: 6399267 (2002-06-01), Nishimura et al.
patent: 6787289 (2004-09-01), Yamada et al.
patent: 6828078 (2004-12-01), Nishimura et al.
patent: 2003/0171468 (2003-09-01), Nishimura et al.
patent: 2004/0005506 (2004-01-01), Nishimura et al.
patent: 0 041 657 (1981-12-01), None
patent: 0 225 454 (1987-06-01), None
patent: 45-11712 (1970-04-01), None
patent: 55-9433 (1980-03-01), None
patent: 56-17345 (1981-02-01), None
patent: 57-31674 (1982-02-01), None
patent: 57-40526 (1982-03-01), None
patent: 58-69217 (1983-04-01), None
patent: 60-37549 (1985-02-01), None
patent: 62-25705 (1987-02-01), None
patent: 62-136638 (1987-06-01), None
patent: 62-190211 (1987-08-01), None
patent: 63-97945 (1988-04-01), None
patent: 64-003647 (1989-01-01), None
patent: 2-146544 (1990-06-01), None
patent: 3-192310 (1991-08-01), None
patent: 4-107460 (1992-04-01), None
patent: 4-303843 (1992-10-01), None
patent: 4-330444 (1992-11-01), None
patent: 5-60931 (1993-03-01), None
patent: 5-117392 (1993-05-01), None
patent: 6-75377 (1994-03-01), None
patent: 7-56026 (1995-03-01), None
patent: 7-56354 (1995-03-01), None
patent: 7-92313 (1995-04-01), None
patent: 7-244378 (1995-09-01), None
patent: 8-336911 (1996-12-01), None
patent: 8-337609 (1996-12-01), None
patent: 9-133813 (1997-05-01), None
patent: 9-178901 (1997-07-01), None
patent: 2002296402 (2002-10-01), None
patent: 93/19505 (1993-09-01), None
patent: 94/04949 (1994-03-01), None
patent: 97/44714 (1997-11-01), None
patent: WO 9744714 (1997-11-01), None
English language abstract of JP 2002-296402.
MACROMOLECULES, vol. 29, pp. 5529-5534 1996.
POLYMER, vol. 17, pp. 1086-1090 1976.
Macromol. Chem. Rapid Commun., vol. 7, pp. 121-126 1986.
Polymer Sci., vol. A-1, pp. 2375-2381 1970.
Macromol. Chem., vol. 179, pp. 1689-1697 1978.
J. Am. Chem. Soc., vol. 54, pp. 1579-1587 1932.
J. Polym. Sci., vol. 29, pp. 343-353 1958.
MACROMOLECULES, vol. 25, pp. 12-17 1992.
MACROMOLECULES, vol. 20, pp. 705-712 1987.
MACROMOLECULES, vol. 21, pp. 1925-1929 1988.
Macromol. Chem., Rapid Commun., vol. 11, pp. 83-88 1990.
Bessho Nobuo
Kumano Atsushi
Nishimura Isao
Shimokawa Tsutomu
Yamada Kenji
JSR Corporation
Oblon & Spivak, McClelland, Maier & Neustadt P.C.
Walke Amanda
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