Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2011-03-08
2011-03-08
Kelly, Cynthia H (Department: 1722)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S311000, C430S313000, C430S326000, C430S330000, C430S331000
Reexamination Certificate
active
07901864
ABSTRACT:
A radiation-sensitive composition (and method of fabricating a device using the composition) includes a nonpolymeric silsesquioxane including at least one acid labile moiety, a polymer including at least one member selected from the group consisting of an aqueous base soluble moiety and an acid labile moiety, and a radiation-sensitive acid generator. Another radiation-senstive composition (and method of fabricating a device using the composition) includes a nonpolymerc silsesquioxane including at least one aqueous base soluble moiety, a polymer including an aqueous base soluble moiety, a crosslinker, and a radiation-sensitive acid generator.
REFERENCES:
patent: 5338818 (1994-08-01), Brunsvold et al.
patent: 5484867 (1996-01-01), Lichtenhan et al.
patent: 5691110 (1997-11-01), Bohrer et al.
patent: 6197473 (2001-03-01), Kihara et al.
patent: 6210856 (2001-04-01), Lin et al.
patent: 6420084 (2002-07-01), Angelopoulos et al.
patent: 6420088 (2002-07-01), Angelopoulos et al.
patent: 6461789 (2002-10-01), Hatakeyama et al.
patent: 6468712 (2002-10-01), Fedynyshyn
patent: 6503686 (2003-01-01), Fryd et al.
patent: 6509134 (2003-01-01), Ito et al.
patent: 6548219 (2003-04-01), Ito et al.
patent: 6632582 (2003-10-01), Kishimura et al.
patent: 6724091 (2004-04-01), Jayaraman et al.
patent: 6759460 (2004-07-01), Kamo et al.
patent: 6946736 (2005-09-01), Gleason et al.
patent: 6994946 (2006-02-01), Hatakeyama et al.
patent: 7008750 (2006-03-01), Barclay et al.
patent: 7141692 (2006-11-01), Allen et al.
patent: 2002/0013059 (2002-01-01), Kishimura et al.
patent: 2002/0090572 (2002-07-01), Sooriyakumaran et al.
patent: 2002/0102490 (2002-08-01), Ito et al.
patent: 2002/0146638 (2002-10-01), Ito et al.
patent: 2002/0146639 (2002-10-01), Brock et al.
patent: 2002/0164538 (2002-11-01), Allen et al.
patent: 2002/0182541 (2002-12-01), Gonsalves
patent: 2003/0171490 (2003-09-01), Breyta et al.
patent: 2003/0207208 (2003-11-01), Uenishi
patent: 2004/0120915 (2004-06-01), Yang et al.
patent: 2005/0112382 (2005-05-01), Allen et al.
“Chemically Amplified Resists: Past, Present, and Future”; Author: Hiroshi Ito; Part of SPIE Conference on Advances in Resist Technology and Processing XVI; Mar. 1999, SPIE vol. 3678.
Angelopoulos Marie
Brunner Timothy A.
Huang Wu-Song
Pfeiffer Dirk
Sooriyakumaran Ratnam
International Business Machines - Corporation
Johnson Connie P
Kelly Cynthia H
McGinn IP Law Group PLLC
LandOfFree
Radiation-sensitive composition and method of fabricating a... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Radiation-sensitive composition and method of fabricating a..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Radiation-sensitive composition and method of fabricating a... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2658986