Radiation sensitive composition

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

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4302851, 4302841, 430143, 430176, 430188, 430190, 430192, 430195, 430196, G03F 7027, G02B 522

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06140019&

ABSTRACT:
A radiation sensitive composition comprising (A) a colorant containing a quinacridone pigment, a mixture of an isoindolinone pigment and a yellow organic pigment or a mixture of copper phthalocyanine blue and a green pigment, (B) an alkali-soluble resin, (C) a polyfunctional monomer and (D) a photopolymerization initiator. The composition is useful for production of an additive or subtractive color filter which is used in a reflection-type color liquid crystal display device.

REFERENCES:
patent: 4934791 (1990-06-01), Shimizu et al.
patent: 5095379 (1992-03-01), Fuknaga et al.
patent: 5240797 (1993-08-01), Matsushima et al.
patent: 5362603 (1994-11-01), Katoh et al.
patent: 5498498 (1996-03-01), Uchikawa et al.
Registry No. 980-26-7 in Registry File on STN Database, copyright 1999, ACS, online, 2 pages.
Kobayashi et al, Derweet--ACC-No. 1989-174539, English Abstract of Japanese Patent Document JP 01152449A issued Jun. 14, 1989, 3 pages.
Registry No. 1047-16-1, in Registry File of STN Database, Copyright 1999, ACS, 2 pages.
Patent Abstracts of Japan, vol. 11, No. 298 (P-620), Sep. 26, 1987, JP 62 089905, Apr. 24, 1987.
Patent Abstracts of Japan, vol. 12, No. 170 (P-705), May 20, 1988, JP 62 280807, Dec. 5, 1987.
Patent Abstracts of Japan, vol. 11, No. 234 (P-628), Oct. 22, 1987, JP 62 108204, May 19, 1987.
Patent Abstracts of Japan, vol. 10, No. 180 (P-471), Jun. 24, 1986, JP 61 027506, Feb. 7, 1986.
Patent Abstracts of Japan, vol. 11, No. 298 (P-620), Sep. 26, 1987, JP 62 089905, Apr. 24, 1987.

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