Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1998-07-23
2000-10-31
Hamilton, Cynthia
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
4302851, 4302841, 430143, 430176, 430188, 430190, 430192, 430195, 430196, G03F 7027, G02B 522
Patent
active
06140019&
ABSTRACT:
A radiation sensitive composition comprising (A) a colorant containing a quinacridone pigment, a mixture of an isoindolinone pigment and a yellow organic pigment or a mixture of copper phthalocyanine blue and a green pigment, (B) an alkali-soluble resin, (C) a polyfunctional monomer and (D) a photopolymerization initiator. The composition is useful for production of an additive or subtractive color filter which is used in a reflection-type color liquid crystal display device.
REFERENCES:
patent: 4934791 (1990-06-01), Shimizu et al.
patent: 5095379 (1992-03-01), Fuknaga et al.
patent: 5240797 (1993-08-01), Matsushima et al.
patent: 5362603 (1994-11-01), Katoh et al.
patent: 5498498 (1996-03-01), Uchikawa et al.
Registry No. 980-26-7 in Registry File on STN Database, copyright 1999, ACS, online, 2 pages.
Kobayashi et al, Derweet--ACC-No. 1989-174539, English Abstract of Japanese Patent Document JP 01152449A issued Jun. 14, 1989, 3 pages.
Registry No. 1047-16-1, in Registry File of STN Database, Copyright 1999, ACS, 2 pages.
Patent Abstracts of Japan, vol. 11, No. 298 (P-620), Sep. 26, 1987, JP 62 089905, Apr. 24, 1987.
Patent Abstracts of Japan, vol. 12, No. 170 (P-705), May 20, 1988, JP 62 280807, Dec. 5, 1987.
Patent Abstracts of Japan, vol. 11, No. 234 (P-628), Oct. 22, 1987, JP 62 108204, May 19, 1987.
Patent Abstracts of Japan, vol. 10, No. 180 (P-471), Jun. 24, 1986, JP 61 027506, Feb. 7, 1986.
Patent Abstracts of Japan, vol. 11, No. 298 (P-620), Sep. 26, 1987, JP 62 089905, Apr. 24, 1987.
Kumano Atsushi
Nemoto Hiroaki
Sakurai Kouichi
Hamilton Cynthia
JSR Corporation
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