Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1994-06-21
1996-01-09
Chu, John S. Y.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430171, 430176, 430189, 430191, 430192, 430193, 430910, 430920, 430921, 522 31, 522 32, 522 36, 522 39, 522 63, G03F 7004, G03F 7023, G03C 152
Patent
active
054828163
ABSTRACT:
A radiation-sensitive composition comprising (A) a polymer having a recurring unit represented by formula (1): ##STR1## wherein R.sup.1 represents a substituted methyl group, a substituted ethyl group, a silyl group, a germyl group or an alkoxycarbonyl group, and R.sup.2 represents --OR.sup.3 or --NR.sup.4 R.sup.5 in which R.sup.3 is a hydrogen atom, a straight-chain alkyl group, a cyclic alkyl group, an aryl group, an aralkyl group, a substituted methyl group, a substituted ethyl group, a silyl group, a germyl group or an alkoxycarbonyl group, and R.sup.4 and R.sup.5, which may be the same or different, are hydrogen atoms, straight-chain alkyl groups, cyclic alkyl groups, aralkyl groups or aryl groups, and (B) a radiation-sensitive acid forming agent. Said radiation-sensitive composition can be suitably used as a resist composition which enables reliable fine processing, which has high sensitivity and high resolution degree, and which is superior in dry etching resistance, develop-ability, adhesiveness, heat resistance and yield of residual film thickness.
REFERENCES:
patent: 4946760 (1990-08-01), Elsaesser
patent: 5068168 (1991-11-01), Lee
patent: 5332650 (1994-07-01), Murata et al.
patent: 5346803 (1994-09-01), Crivello et al.
Miura Takao
Murata Makoto
Yamachika Mikio
Yumoto Yoshiji
Chu John S. Y.
Japan Synthetic Rubber Co. Ltd.
LandOfFree
Radiation-sensitive composition does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Radiation-sensitive composition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Radiation-sensitive composition will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1302101