Radiation sensitive composition

Details Radiation sensitive composition Radiation sensitive composition

1997-10-21

1999-10-05

Baxter, Janet

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

G03C 1492

Patent

active

059621877

ABSTRACT:
A radiation sensitive composition containing resist materials such as quinonediazido photo active compound and alkali soluble resin, and a mixed solvent comprising (A) 1 to 25% by weight of propylene glycol derivatives as represented by the formula:

REFERENCES:
patent: 5302487 (1994-04-01), Arneth et al.
patent: 5420331 (1995-05-01), Ueda et al.
patent: 5426017 (1995-06-01), Johnson et al.
patent: 5458921 (1995-10-01), Briguglio et al.
patent: 5612303 (1997-03-01), Takayanagi et al.
patent: 5629135 (1997-05-01), Kobayashi et al.
English translation of JP 4-9063, 1992.

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