Radiation sensitive composition

Details Radiation sensitive composition Radiation sensitive composition

1995-02-17

1997-01-21

Le, Hoa Van

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430260, 4302811, 4302831, 4302861, 4302881, G03C 172

Patent

active

055958559

ABSTRACT:
A chemically amplified radiation sensitive composition comprising: (a) a copolymer such as poly(4-hydroxystyrene-co-styrene), (b) a dissolution inhibitor such as polyacetal or (b') a crosslinking agent, (c) a radiation sensitive compound capable of generating an acid upon exposure to actinic radiation, (d) a radiation sensitive base capable of stabilizing the width of lines throughout steps from exposure to post-exposure bake treatment, and (e) a solvent for dissolving the components (a) to (d), can realize fine lines and spaces down to 0.22 microns, for example, using KrF laser, and possesses excellent heat and etch resistance and adhesiveness to substrates, and produces patterns with low standing waves arising due to substrate reflectiveness of exposed light.

REFERENCES:
patent: 5286602 (1994-02-01), Pawlowski et al.
patent: 5350660 (1994-09-01), Urano et al.
patent: 5352564 (1994-10-01), Takeda et al.
patent: 5403695 (1995-04-01), Hayase et al.

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