Radiation reduction exposure apparatus and method of manufacturi

Details Radiation reduction exposure apparatus and method of manufacturi Radiation reduction exposure apparatus and method of manufacturi

1997-04-24

2000-01-11

Porta, David P.

X-ray or gamma ray systems or devices

Specific application

Lithography

378 35, H01L 2130

Patent

active

060144211

ABSTRACT:
An X-ray reduction exposure apparatus which provides a preferable image forming system in an entire mask surface area of a reflection type mask, can reduce curvature of the field and astigmatism of the transfer image even in scan exposure and, therefore, can obtain high transfer precision, and the apparatus contributes to the manufacture of a semiconductor element having high reliability. The X-ray reduction exposure apparatus has, as a characteristic feature, a drive mechanism for driving a mask scan stage substantially along the curvature surface of the mask. This drive mechanism is constituted by a main drive section (linear motor or the like) linearly driven in a direction corresponding to the moving direction of a mask scan stage and a sub-drive section (actuator or the like) driven perpendicularly to the drive direction, otherwise, constituted by a main drive section and a guide having a shape which is the same as the curvature surface shape of the mask.

REFERENCES:
patent: 5003567 (1991-03-01), Hawryluk et al.
patent: 5390228 (1995-02-01), Niibe et al.

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