Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1981-12-15
1984-07-03
Brammer, Jack P.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430281, 430905, 430906, 20415919, 20415922, 528 75, G03C 168
Patent
active
044580070
ABSTRACT:
A radiation-polymerizable mixture comprising a polymeric binder, a radiation-activatable polymerization initiator and a polymerizable acrylate or methacrylate ester having at least two urethane groups in the molecule, said ester being a reaction product of glycerol dimethacrylate or glycerol diacrylate and a polyisocyanate obtained by reacting a polyhydroxy compound having from two to six hydroxyl groups with a diisocyanate or a reaction product of glycerol dimethacrylate or glycerol diacrylate and a diisocyanate. The new polymerizable urethanes provide the mixture with a high light-sensitivity, good reciprocity and a low tendency to crystallize.
REFERENCES:
patent: 3701679 (1972-10-01), Johnson et al.
patent: 3850770 (1974-11-01), Juna et al.
patent: 3954584 (1976-05-01), Miyata et al.
patent: 4098918 (1978-07-01), DeMajistre
patent: 4120721 (1978-10-01), Ketley et al.
patent: 4198238 (1980-04-01), Scheve
patent: 4210713 (1980-07-01), Sumiyoshi et al.
patent: 4250248 (1981-02-01), Faust
Geissler Ulrich
Hasenjaeger Manfred
Herwig Walter
Sprengel Heide
Brammer Jack P.
Hoechst Aktiengesellschaft
LandOfFree
Radiation polymerizable mixture containing reaction products of does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Radiation polymerizable mixture containing reaction products of , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Radiation polymerizable mixture containing reaction products of will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1630798