Radiation curable solvent-free compositions

Details Radiation curable solvent-free compositions Radiation curable solvent-free compositions

1976-11-05

1980-05-06

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430905, 20415915, G03C 168

Patent

active

042018420

ABSTRACT:
An improved photosensitive resin system being essentially solvent-free which contains an ester produced from an unsaturated organic acid and a polyhydroxyl containing material, a photoinitiator, a carbonyl initiator, and a monomer capable of reacting with an acrylic monomer, wherein an improvement comprises an additional component comprising an unsaturated hydroxyl containing polymer hydrocarbon. The improved composition has curing rates far in excess of those systems not using the hydroxyl containing unsaturated polymer. In particular, the advantages obtained through the use of the additional component are much faster curing of the composition, exceptional gloss, toughness, abrasion resistance and good rub resistance.

REFERENCES:
patent: 3551246 (1970-12-01), Bassemir et al.
patent: 3551311 (1970-12-01), Nass et al.
patent: 3832421 (1974-05-01), Morgan
patent: 3839171 (1974-10-01), Akamatsu et al.
patent: 3843572 (1974-10-01), Morgan
patent: 3876519 (1975-04-01), McGinnis

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