Radiation-curable mixture, and radiation-sensitive recording mat

Details Radiation-curable mixture, and radiation-sensitive recording mat Radiation-curable mixture, and radiation-sensitive recording mat

1990-03-12

1997-03-25

Lesmes, George F.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430919, 430920, 430921, 430925, 522 67, G03C 1492, G03C 1494, G03C 176, C08F 246

Patent

active

056143516

ABSTRACT:
A radiation-curable mixture is disclosed which contains a compound which forms an acid under the action of high-energy radiation, and contains an acid-curable compound, wherein the compound which forms an acid contains aliphatically bound halogen (chlorine or bromine) and has a pK.sub.a value of less than about 12. A radiation-curable recording material and a process for recording high-energy radiation using the material are also disclosed. The mixture, and in particular the recording material produced therefrom, has relatively high sensitivity and improved resolution and, in addition, does not exhibit image fogging after development.

REFERENCES:
patent: 3615455 (1971-10-01), Laridon et al.
patent: 3686284 (1972-08-01), Rosenkranz et al.
patent: 3692560 (1972-09-01), Rosenkranz et al.
patent: 3912606 (1975-10-01), Pacifici et al.
patent: 4101323 (1978-07-01), Buhr et al.
patent: 4189323 (1980-02-01), Buhr
patent: 4193799 (1980-03-01), Crivello
patent: 4247611 (1981-01-01), Sander et al.
patent: 4289845 (1981-09-01), Bowden et al.
patent: 4311782 (1982-01-01), Buhr et al.
patent: 4398001 (1983-08-01), Cheng et al.
patent: 4491628 (1985-01-01), Ito et al.
patent: 4678737 (1987-07-01), Schneller et al.
patent: 4699289 (1987-08-01), Crivello
patent: 4699867 (1987-10-01), Schneller
patent: 4916046 (1990-04-01), Doessel
patent: 5217843 (1993-06-01), Dammel et al.
patent: 5403697 (1995-04-01), Doessel et al.
Crivello Polymer Engineering and Science, Dec. 1983 vol. 23, No. 17, pp. 953-956.
Burns et al, Microelectronic Engineering 6, 1987 pp. 467-471.
Taylor, "X-Ray Resist Trends," Solid State Technology, Jun. 1984, pp. 124-131.
Yamaoka et al., "Crosslinking of Polymers with Irradiating Rh, L.varies.X Ray--Effect of Active Groups and a Heavy Atom on Crosslinking," Society of Photographic Scientists and Engineers, Photographic Science and Engineering, vol. 23, No. 4, Jul./Aug. 1979, pp. 196-202.
Bowden et al., "A Sensitive Novolac-Based Positive Electron Resist," J. Electrochem. Soc.: Solid-State Science and Technology, Jun. 1981, pp. 1304-1313.
Bruns et al., "A Study of Catalytically Transformed Negative X-Ray Resists, Based on Aqueous Based Developable Resin, An Acid Generator and A Crosslinker," Microelectronic Engineering 6, 1987, pp. 467-471.

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