Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1980-05-01
1981-08-18
Brammer, Jack P.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
20415919, 20415922, 430275, 430278, 430285, 430286, 528112, 528176, G03C 194, G03C 168
Patent
active
042847109
ABSTRACT:
Solvent-soluble polymeric esters and polymeric esterethers with radiation-crosslinkable ethylenic unsaturation in the linear polymeric structure, and recurring pendant hydroxyl groups, are derived from monomers which include diepoxides and monomers with at least one .alpha.,.beta.-unsaturated carboxylic acid group. These polymeric products react with cyclic anhydrides to form aqueous alkaline-soluble polymers which are useful as films for photomechanical processes, including lithographic applications and as photoresists.
REFERENCES:
patent: 3594410 (1971-07-01), Cohen et al.
patent: 3707373 (1972-12-01), Martinson et al.
patent: 3867318 (1975-02-01), Nishikubo et al.
patent: 3996121 (1976-12-01), Green et al.
Brammer Jack P.
E. I. Du Pont de Nemours and Company
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