Radiant energy collector having plasma-textured polyimide expose

Details Radiant energy collector having plasma-textured polyimide expose Radiant energy collector having plasma-textured polyimide expose

1984-05-09

1985-06-04

Newsome, John H.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

126417, 126901, 156643, F24J 302, B05D 314

Patent

active

045214425

ABSTRACT:
A method of fabricating a radiant energy collector is disclosed wherein a substrate is coated on at least a portion of the surface to be exposed to radiant energy, with polyimide then surface-textured employing known procedures, e.g., plasma etching, reactive ion etching or a combination of these techniques, to impart to the coated surface high absorptivity and low emissivity for radiant energy.

REFERENCES:
patent: 3810777 (1974-05-01), Boebel et al.
patent: 4005698 (1977-02-01), Cuomo et al.
patent: 4160045 (1979-07-01), Longshore
patent: 4233107 (1980-11-01), Johnson
patent: 4235226 (1980-11-01), Scherber et al.
patent: 4252865 (1981-02-01), Gilbert et al.
patent: 4357369 (1982-11-01), Kilichowski et al.
patent: 4440606 (1984-04-01), Powers et al.
patent: 4448487 (1984-05-01), Cuomo et al.
patent: 4478209 (1984-10-01), Guarnieri et al.
Kemlage et al., "IBM Tech. Disc. Bull.," vol. 19, No. 9, Feb. 1977, pp. 3378-3379.

Affiliated with

Also associated with

Rating

Radiant energy collector having plasma-textured polyimide expose does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Radiant energy collector having plasma-textured polyimide expose, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Radiant energy collector having plasma-textured polyimide expose will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-828483