Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate
2007-11-20
2007-11-20
Hassanzadeh, Parviz (Department: 1763)
Coating apparatus
Gas or vapor deposition
With treating means
C118S7230MA, C156S345360, C156S345410, C156S345420
Reexamination Certificate
active
10343221
ABSTRACT:
A plasma device includes a first conductive plate (31) in which a plurality of slots (36) are formed, a second conductive plate (32) having a microwave inlet (35) and disposed opposite to the first conductive plate (31), a ring member (34) for connecting peripheral edges of the first and second conductive plates (31, 32), and a conductive adjusting member (37) provided on said second conductive plate (32) within a radial waveguide (33) formed by the first and second conductive plates (31, 32) and serving to adjust a distance (d1, d2) up to the first conductive plate (31). With this arrangement, a desired electric field radiation distribution can be obtained without inducing abnormal discharge.
REFERENCES:
patent: 5698036 (1997-12-01), Ishii et al.
patent: 11-67492 (1999-03-01), None
patent: 11-067492 (1999-03-01), None
patent: 2000-164394 (2000-06-01), None
patent: 2000-164394 (2000-06-01), None
Ishii Nobuo
Shinohara Kibatsu
Crowell Michelle
Crowell & Moring LLP
Hassanzadeh Parviz
Tokyo Electron Limited
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