Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Finishing or perfecting composition or product
Patent
1997-11-26
1998-12-22
Young, Christopher G.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Finishing or perfecting composition or product
430296, 430942, G03C 500
Patent
active
058517391
ABSTRACT:
A developer for quinonediazide
ovlak positive electron beam resists including alkali metal ions, weak acid ions and a water soluble organic compound subject to the following conditions: 0.05.ltoreq.a.ltoreq.0.5, 0.07.ltoreq.bn.ltoreq.1.5 and a<bn or a>bn, wherein a is the concentration of the alkali metal in mol/kg, b is the concentration of the weak acid in mol/kg and n is the valence of the weak acid ions, and the concentration of the water soluble organic compound is 0.5 to 10 wt %, based on the total weight of the developer.
REFERENCES:
patent: 5155011 (1992-10-01), Zertani et al.
patent: 5155012 (1992-10-01), Joerg et al.
patent: 5278030 (1994-01-01), Ingham et al.
patent: 5279927 (1994-01-01), Walls et al.
patent: 5316892 (1994-05-01), Walls et al.
Asano Masaya
Kanetsuki Shigeyoshi
Kataoka, deceased Mutsuo
Oosedo Hiroki
Tamura Kazutaka
Miller Austin R.
Toray Industries Inc.
Young Christopher G.
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