Chemistry: fertilizers – Processes and products – Forms or conditioning
Patent
1987-07-01
1989-04-25
Springer, David B.
Chemistry: fertilizers
Processes and products
Forms or conditioning
546167, 546 15, 546115, A01N 4350, C07D40104
Patent
active
048244740
ABSTRACT:
A pyridine derivative having the formula: ##STR1## wherein one of A, B, D and E is oxygen, sulfur, --SO--, --SO.sub.2 --, --NR.sup.3 --, ##STR2## or .dbd.CH-- with the rest being all carbon atoms; X is halogen, C.sub.1 -C.sub.4 alkyl, C.sub.1 -C.sub.4 alkoxy, C.sub.1 -C.sub.4 haloalkyl, C.sub.1 -C.sub.4 haloalkoxy, C.sub.1 -C.sub.4 alkylthio, C.sub.1 -C.sub.4 haloalkylthio, C.sub.1 -C.sub.4 alkoxycarbonyl, C.sub.1 -C.sub.4 alkylthioalkyl, tetrahydrothiopyranyl, hydroxyl, CF.sub.3, phenyl or pyridyl; n is an integer of from 0 to 6,; W is oxygen or sulfur; R is hydrogen, di-lower alkylimino, C.sub.1 -C.sub.5 alkyl, C.sub.2 -C.sub.5 alkenyl, C.sub.2 -C.sub.5 alkynyl, C.sub.4 or C.sub.5 oxacycloalkyl, C.sub.2 -C.sub.5 mono-, di- or tri-haloalkenyl, C.sub.2 -C.sub.5 haloalkynyl, glycidyl, furfuryl, alkylthioalkyl, C.sub.3 -C.sub.6 cycloalkyl or a cation R.sup.1 is C.sub.1 -C.sub.4 alkyl, R.sup.2 is C.sub.1 -C.sub.4 alkyl or C.sub.3 -C.sub.6 cycloalkyl, or R.sup.1 and R.sup.2 together with the adjacent carbon atom, form C.sub.3 -C.sub.6 cycloalkyl; and R.sup.3 is hydrogen or C.sub.1 -C.sub.3 alkyl.
REFERENCES:
patent: 4459408 (1984-07-01), Maulding et al.
patent: 4614535 (1986-09-01), Schmierer et al.
Hatanaka Masataka
Hattori Kenji
Ikai Takasi
Nawamaki Tsutomu
Numata Tatsuo
Nissan Chemical Industries Ltd.
Springer David B.
LandOfFree
Quinoline derivatives and herbicidal compositions and method of does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Quinoline derivatives and herbicidal compositions and method of , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Quinoline derivatives and herbicidal compositions and method of will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1193485