Quick change sputter target assembly

Details Quick change sputter target assembly Quick change sputter target assembly

1988-04-04

1989-04-11

Weisstuch, Aaron

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

C23C 1434

Patent

active

048203971

ABSTRACT:
A sputter source of the type which relies on thermal expansion of an annular sputter target to make good physical contact with a peripheral cooling wall is disclosed. Novel means are provided for holding the sputter target in place in the source when the source and target are at ambient temperature. In a preferred embodiment of the invention the holding means comprises spring means which cooperate with a groove in either an inner or outer rim of the sputter target. By the application of a sufficient axial force on the target, the gripping force of the spring means is overcome and the target can be removed or inserted. Also shown is a structure which can be used to retrofit the novel quick change target into an existing sputter source.

REFERENCES:
patent: 4204936 (1980-05-01), Hartsough
patent: 4385979 (1983-05-01), Pierce et al.
patent: 4457825 (1984-07-01), Lamont, Jr.
patent: 4564435 (1986-01-01), Wickersham
patent: 4657654 (1987-04-01), Mintz
patent: 4668373 (1987-05-01), Rille et al.

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