Quality measurement of an aerial image

Details Quality measurement of an aerial image Quality measurement of an aerial image

2006-04-25

2006-04-25

Chen, Wenpeng (Department: 2625)

Image analysis

Applications

Manufacturing or product inspection

C716S030000

Reexamination Certificate

active

07035446

ABSTRACT:
A method of measuring the quality of a simulated aerial image includes receiving as input a mask pattern for a chip design, simulating an aerial image of the mask pattern, calculating an error area representative of a deviation between an ideal boundary of the chip design and a boundary of the simulated aerial image, calculating maximum and average end-of-line deviations between the ideal boundary of the chip design and the boundary of the simulated aerial image, and displaying a worst quality area in the simulated aerial image as a function of the error area and the maximum and average end-of-line deviations for visual inspection.

REFERENCES:
patent: 5795688 (1998-08-01), Burdorf et al.
patent: 5801954 (1998-09-01), Le et al.
patent: 5825647 (1998-10-01), Tsudaka
patent: 5900338 (1999-05-01), Garza et al.
patent: 5991477 (1999-11-01), Ishikawa et al.
patent: 6016357 (2000-01-01), Neary et al.
patent: 6081659 (2000-06-01), Garza et al.
patent: 6269472 (2001-07-01), Garza et al.
patent: 6334209 (2001-12-01), Hashimoto et al.
patent: 6578190 (2003-06-01), Ferguson et al.
patent: 6868176 (2005-03-01), Sugawara
patent: 6873720 (2005-03-01), Cai et al.
patent: 2002/0166107 (2002-11-01), Capodieci et al.
patent: 2003/0059104 (2003-03-01), Mitsui
patent: 2004/0057610 (2004-03-01), Filseth et al.

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