Quad processor

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means

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Details

156643, 156646, 204298, H01L 21306, B44C 122

Patent

active

047159219

ABSTRACT:
The present invention includes plural plasma etching vessels and a wafer queuing station arrayed with a wafer transfer arm in a controlled environment. Wafer processing in each vessel is regulated by a state controller for processing a plurality of wafers from a single cassette, contained within the vacuum environment of the plural plasma etching vessels and wafer queuing station, to provide an orderly and efficient throughput of wafers for diverse or similar processing in the plural vessels. In this manner a wafer can be processed as soon as a vessel becomes available.

REFERENCES:
patent: 4477311 (1984-10-01), Mimura et al.
patent: 4547247 (1985-10-01), Warenback et al.
patent: 4548699 (1985-10-01), Hutchinson et al.
patent: 4563240 (1986-01-01), Shibata et al.
patent: 4584045 (1986-04-01), Richards
patent: 4592306 (1986-06-01), Gallego

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