Quad bit using hot-hole erase for CBD control

Static information storage and retrieval – Floating gate – Particular biasing

Reexamination Certificate

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C365S185030, C365S185020

Reexamination Certificate

active

07113431

ABSTRACT:
The present invention pertains to a technique for erasing bits in a dual bit memory in a manner that maintains complementary bit disturb control of bit-pairs of memory cells wherein each bit of the dual bit memory cell can be programmed to multiple levels. One exemplary method comprises providing a word of memory cells after an initial erasure and programming of the bits of the word to one or more of the higher program levels. A disturb level is determined for each of the bit-pairs of the word. A combined disturb level is then computed that is representative of the individual disturb levels. A pattern of drain voltages is then applied to the word for a number of program passes until a target pattern is stored in the word of memory cells based on the combined disturb level and the unprogrammed bit of the bit-pairs is erased to a single program level. In this manner the present invention compensates for the disturbance level that exists between the complementary bit-pairs of the word, improves the Vt distribution at the program level of the erased state and thereby improves the accuracy of subsequent higher level programming operations and mitigates false or erroneous reads of the states of such program levels.

REFERENCES:
patent: 6317364 (2001-11-01), Guterman et al.
patent: 6331951 (2001-12-01), Bautista et al.
patent: 6396741 (2002-05-01), Bloom et al.
patent: 6744675 (2004-06-01), Zheng et al.
“An Embedded 90mm SONOS Flash EEPROM Utilizing Hot Electron Injection Programming and 2-Sided Hot Hole Injection Erase”, E.J. Prinz, G.L. Chindalore, K. Harber, C.M. Hong, C.B. Li and C.T. Swift, reprinted from the Internet at: http://64.233.161.104/search?q=cache:dnXcWWMDMAQJ:www.freescale.com/files/technology—manufacturing/doc/NVM—WORKSHOP—2003—SONOS1.pdf+Motorola+An+Embedded+90nm+SONOS+Flash+EEPROM&hl=en, 2 pgs.

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