Gas separation: processes – Solid sorption – Inorganic gas or liquid particle sorbed
Reexamination Certificate
2007-01-09
2007-01-09
Hopkins, Robert A. (Department: 1724)
Gas separation: processes
Solid sorption
Inorganic gas or liquid particle sorbed
C095S138000, C095S900000, C095S901000
Reexamination Certificate
active
10730506
ABSTRACT:
Purification material for removing a contaminant from an impure hydride gas comprising an adsorbent comprising a reduced metal oxide on a porous support and a desiccant. The porous support may be selected from the group consisting of activated carbon, alumina, silica, zeolite, silica alumina, titania, zirconia, and combinations thereof. The reduced metal oxide may comprise one or more metals selected from the group consisting of Group I alkali metals (lithium, sodium, potassium, rubidium, and cesium), Group II alkaline earth metals (magnesium, calcium, strontium, and barium), and transition metals (manganese, nickel, zinc, iron, molybdenum, tungsten, titanium, vanadium, cobalt, and rhodium). The desiccant may be selected from the group consisting of hygroscopic metal salts, zeolites, single metal oxides, mixed metal oxides, and combinations thereof.
REFERENCES:
patent: 3361531 (1968-01-01), Erb et al.
patent: 3849539 (1974-11-01), Coleman
patent: 4077779 (1978-03-01), Sircar et al.
patent: 4421533 (1983-12-01), Nishino et al.
patent: 4433981 (1984-02-01), Slaugh et al.
patent: 4761395 (1988-08-01), Tom et al.
patent: 4795735 (1989-01-01), Liu et al.
patent: 4869883 (1989-09-01), Thorogood et al.
patent: 4950419 (1990-08-01), Tom et al.
patent: 4983363 (1991-01-01), Tom et al.
patent: 5204075 (1993-04-01), Jain et al.
patent: 5314853 (1994-05-01), Sharma
patent: 5531971 (1996-07-01), Tom et al.
patent: 5536302 (1996-07-01), Golden et al.
patent: 5716588 (1998-02-01), Vergani et al.
patent: 5779767 (1998-07-01), Golden et al.
patent: 5997829 (1999-12-01), Sekine et al.
patent: 6017502 (2000-01-01), Carrea et al.
patent: 6110258 (2000-08-01), Fraenkel et al.
patent: 6113869 (2000-09-01), Jain et al.
patent: 6190627 (2001-02-01), Hoke et al.
patent: 6241955 (2001-06-01), Alvarez, Jr.
patent: 6395070 (2002-05-01), Bhadha et al.
patent: 6428612 (2002-08-01), McPhilmy et al.
patent: 6461411 (2002-10-01), Watanabe et al.
patent: 6511528 (2003-01-01), Lansbarkis et al.
patent: 6524544 (2003-02-01), Alvarez, Jr. et al.
patent: 6638340 (2003-10-01), Kanazirev et al.
patent: 2002/0034467 (2002-03-01), Otsuka et al.
patent: 2002/0082168 (2002-06-01), Graham et al.
patent: 2003/0097929 (2003-05-01), Watanabe et al.
patent: 0 484 301 (1994-10-01), None
patent: 0 470 936 (1994-12-01), None
patent: 1 176 120 (2002-01-01), None
patent: 02184340 (1990-07-01), None
patent: 9-142833 (1997-06-01), None
patent: WO 97/06104 (1997-02-01), None
patent: WO 00/23174 (2000-04-01), None
patent: WO 01/68241 (2001-09-01), None
patent: WO 03/037485 (2003-05-01), None
Battavio Paula Jean
Dong Chun Christine
Golden Timothy Christopher
Wu Dingjun
Air Products and Chemicals Inc.
Chase Geoffrey L.
Hopkins Robert A.
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