Pulsed plasma CVD method for forming a film

Details Pulsed plasma CVD method for forming a film Pulsed plasma CVD method for forming a film

2006-10-24

2006-10-24

Chen, Bret (Department: 1762)

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

C427S571000, C427S575000, C427S577000, C427S582000, C427S584000, C427S249700, C427S249800, C427S255280

Reexamination Certificate

active

07125588

ABSTRACT:
A method of forming an insulating ceramic film or a metallic film by a plasma CVD process in which a high density plasma is generated in the presence of a magnetic field wherein the electric power for generating the plasma has a pulsed waveform. The electric power typically is supplied by microwave, and the pulsed wave may be a complex wave having a two-step peak, or may be a complex wave obtained by complexing a pulsed wave with a stationary continuous wave.

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