Pulse anneal method for solar cell

Batteries: thermoelectric and photoelectric – Photoelectric – Cells

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29572, 29576T, 148 15, 357 30, 427 39, 427 74, H01L 3106, H01L 3118

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045394318

ABSTRACT:
A solar cell including a pulse annealed layer of crystalline, amorphous or polycrystalline semiconductor material of one conductivity type and either a layer of opposite conductivity type or a liquid electrolyte forming a collector junction therewith. A method of improving the characteristics of a solar cell including at least one layer of crystalline, amorphous or polycrystalline semiconductor material which includes the step of pulse annealing said semiconductor material.

REFERENCES:
patent: 4273950 (1981-06-01), Chitre
patent: 4331485 (1982-05-01), Gat
patent: 4353160 (1982-10-01), Armini et al.
patent: 4370175 (1983-01-01), Levatter
patent: 4370510 (1983-01-01), Stirn
patent: 4379020 (1983-04-01), Glaeser et al.
patent: 4385198 (1983-05-01), Rahilly
patent: 4392011 (1983-07-01), Pankove et al.
patent: 4392297 (1983-07-01), Little
G. A. Landis et al., Conf. Record, 15th IEEE Photovoltaic Specialists Conf., (1981), pp. 976-980.
E. Fogarassy et al., 2nd E. C. Photovoltaic Solar Energy Conf., (1979), Reidel Pub. Co., (1979), pp. 768-775.
R. T. Young et al., SPIE, vol. 198, pp. 36-41, (1979).
Y. K. Chan et al., Appl. Phys. Lett., vol. 22, pp. 628-629, (1973).
M. S. Wrighton et al., J. Am. Chem. Soc., vol. 100, pp. 1602-1603, (1978).

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