Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1990-10-18
1991-10-29
Brammer, Jack P.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430271A, 430300, 430306, G03C 176
Patent
active
050615980
ABSTRACT:
A dry PS plate comprises a substrate provided thereon with in order a primer layer, a light-sensitive layer and a silicone rubber layer wherein the primer layer comprises at least one compound selected from the group consisting of those having urethane or/and urea bonds and is adhered to the substrate with a functional group containing silane coupling agent represented by the following general formula: ##STR1## wherein n is an integer ranging from 1 to 3; X represents an alkyl group, a vinyl group or an organic group having a functional group showing affinity to or capable of being bonded to the compound included in the primer layer; R represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms; and Y represents an organic group which generates a hydroxyl group through hydrolysis or a hydroxyl group. In the dry PS plate, the adhesion strength between the substrate and the light-sensitive layer is substantially improved, the adhesion is surely maintained even after imagewise exposure to light and the subsequent development. The dry PS plate shows excellent image reproduction and the resulting dry lithographic plate is excellent in printing durability as well as resistance to scratch.
REFERENCES:
patent: 4732858 (1989-03-01), Brewer et al.
patent: 4861698 (1989-08-01), Hiruma et al.
patent: 4874686 (1989-10-01), Urabe et al.
patent: 4935332 (1990-06-01), Lauke et al.
Abe Yukio
Urabe Yoshihiko
Brammer Jack P.
Fuji Photo Film Co. , Ltd.
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