Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
Reexamination Certificate
2006-05-09
2006-05-09
Dang, Trung (Department: 2823)
Semiconductor device manufacturing: process
Coating of substrate containing semiconductor region or of...
Insulative material deposited upon semiconductive substrate
C438S608000, C438S609000, C438S795000
Reexamination Certificate
active
07041608
ABSTRACT:
A method of making an electronic device in which a conductive electrode has been formed over a substrate including using a liquid to clean the conductive electrode, heating in a processing station the conductive electrode to a temperature which dries the conductive electrode and thereby removes residual cleaning liquid applied during the cleaning step, and providing an oxidizing plasma in the processing station to modify the properties of the conductive electrode. The method also includes producing a fluorocarbon plasma in the processing station to form a fluorocarbon layer over the modified conductive electrode, and further processing the structure to produce the electronic device.
REFERENCES:
patent: 3172862 (1965-03-01), Gurnee et al.
patent: 3173050 (1965-03-01), Gurnee et al.
patent: 3710167 (1973-01-01), Dresner et al.
patent: 4356429 (1982-10-01), Tang
patent: 4539507 (1985-09-01), VanSlyke et al.
patent: 4720432 (1988-01-01), VanSlyke et al.
patent: 4885211 (1989-12-01), Tang et al.
patent: 4950950 (1990-08-01), Perry et al.
patent: 5047687 (1991-09-01), VanSlyke
patent: 5059861 (1991-10-01), Littman et al.
patent: 5059862 (1991-10-01), VanSlyke et al.
patent: 5061569 (1991-10-01), VanSlyke et al.
patent: 5073446 (1991-12-01), Scozzafava et al.
patent: 5141671 (1992-08-01), Bryan et al.
patent: 5150006 (1992-09-01), Van Slyke et al.
patent: 5151629 (1992-09-01), VanSlyke
patent: 5776622 (1998-07-01), Hung et al.
patent: 6127004 (2000-10-01), Hatwar et al.
patent: 6208077 (2001-03-01), Hung
patent: 6696177 (2004-02-01), Hatwar
patent: 2003/0137242 (2003-07-01), Seki
patent: 2004/0031962 (2004-02-01), Hasegawa et al.
patent: 2004/0201048 (2004-10-01), Seki et al.
patent: 2005/0048786 (2005-03-01), Jo
“Enhanced performance of polymer light-emitting diodes using high-surface area polyaniline network electrodes” by Y. Yang, E. Westerweele, C. Zhang, P. Smith, and A.J. Heeger, Journal of Applied Physics, vol. 77, 694 (1995).
“Organic electroluminescent devices with improved stability” by S.A. Van Slyke, C.H. Chen, and C.W. Tang, Applied Physics Letters, vol. 69, 2160 (1996).
“Surface modification of indium tin oxide by plasma treatment: An effective method to improve the efficiency, brightness, and reliability of organic light emitting devices” by C.C. Wu, C.I. Wu, J.C. Sturm, and A. Kahn, Applied Physics Letters, vol. 70, 1348 (1997).
Grace Jeremy M.
Heinsler Michael J.
Sieber Kurt D.
Spindler Jeffrey P.
Dang Trung
Eastman Kodak Company
Owens Raymond L.
LandOfFree
Providing fluorocarbon layers on conductive electrodes in... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Providing fluorocarbon layers on conductive electrodes in..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Providing fluorocarbon layers on conductive electrodes in... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3538071