Protective shield around the inner edge of endpoint window in a

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

118723MW, 118723ME, 31511121, C23F 102, C23C 1600

Patent

active

058513434

ABSTRACT:
The present invention provides a protective shield for a plasma etcher. The protective shield 40 protects the chamber wall 30 around the etch detect window from plasma etching and electrical arcing. The invention comprises a plasma etcher 10 has a wall 30 surrounding a chamber 14. The wall has an opening 16. The wall 30 having an inside face 30A and an outside face 30B. An opening edge 30C defines the opening 16. A window 24 covers over the opening 16 and over a portion of the outside face 30B of the wall. The protective shield 40 covers the opening edge 30C around the opening 16 and a portion of the inside face 30A of the wall 30 around the opening 16. The shield 40 is composed of an electrically insulating and plasma resistant material whereby the protective shield 40 prevents the chamber from arching and generating particles and extends the lifetime of the wall 30.

REFERENCES:
patent: 4952273 (1990-08-01), Popov
patent: 4954212 (1990-09-01), Gadriel et al.
patent: 5432315 (1995-07-01), Kaji et al.
patent: 5567268 (1996-10-01), Kadomura

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Protective shield around the inner edge of endpoint window in a does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Protective shield around the inner edge of endpoint window in a , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Protective shield around the inner edge of endpoint window in a will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2042215

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.