Protection of a refractory metal silicide during high-temperatur

Details Protection of a refractory metal silicide during high-temperatur Protection of a refractory metal silicide during high-temperatur

1989-12-26

1990-11-20

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156653, 156656, 156657, 156662, 427 38, 437200, 437238, 437241, H01L 21306, B44C 122, C03C 1500, C23F 102

Patent

active

049716557

ABSTRACT:
A method for protecting a refractory metal silicide during high-temperature processing using a dual-layer cap of silicon oxide and silicon nitride. The problem of a silicon nitride protective layer detaching itself from an underlying refractory metal silicide layer during high-temperature processing, thus allowing tungsten atoms within the layer to oxidize, is solved by laying down a silicon oxide layer beneath the silicon nitride layer. The oxide layer acts as a mechanical stress relief layer between the refractory metal silicide and the silicon nitride layer, preventing the lifting of the nitride layer during high-temperature processing steps.

REFERENCES:
patent: 4668365 (1987-05-01), Foster et al.
patent: 4744859 (1988-05-01), Hu et al.
patent: 4869781 (1989-09-01), Euen et al.

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