Protecting metal conductors with sacrificial organic monolayers

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C438S780000, C438S781000

Reexamination Certificate

active

06905958

ABSTRACT:
A structure and method for protecting exposed copper lines with chemisorbed, sacrificial, organic monolayers from further processing steps are herein described.

REFERENCES:
patent: 5236602 (1993-08-01), Jackson
patent: 6297169 (2001-10-01), Mangat et al.
patent: 6323131 (2001-11-01), Obeng et al.
patent: 6482733 (2002-11-01), Raaijmakers et al.
patent: 6482740 (2002-11-01), Soininen et al.
patent: 6518168 (2003-02-01), Clem et al.
Laibinis, Paul E., et al., “Comparison of the Structures and Wetting Properties of Self-Assembled Monolayers of n-Alkanethiols on the Coinage Metal Surfaces, Cu, Ag, Au,” Journal of the American Chemical Society, vol. 113, No. 19; Sep. 11, 1991, pp. 7152-7167.
Laibinis, Paul E., et al., “Self-Assembled Monolayers of n-Alkanethiolates on Copper are Barrier Films That Protect the Metal Against Oxidation by Air,” Journal of the American Chemical Society, vol. 114, 1992, pp. 9022-9028.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Protecting metal conductors with sacrificial organic monolayers does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Protecting metal conductors with sacrificial organic monolayers, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Protecting metal conductors with sacrificial organic monolayers will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3499500

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.