Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2005-05-31
2005-05-31
Hamilton, Cynthia (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S280100, C430S270100, C430S326000, C430S325000
Reexamination Certificate
active
06899995
ABSTRACT:
The invention relates to a photoresist composition having a protecting group and a protected material incorporated in a cyclic chemical structure. In this invention a protected material has a cyclic ether group or cyclic ester group as a protecting group. A specific example of a cyclic ether group is an alkylene oxide, such as an oxetane group, substituted with one or more fluorinated alkyl groups. A specific example of a cyclic ester is a lactone which may be substituted with methyl groups. The photoresist composition further includes a photoactive component. The photoresist composition of this invention has a high transparency to ultraviolet radiation, particularly at short wavelengths such as (193) nm and (157) nm.
REFERENCES:
patent: 6699635 (2004-03-01), Kodama et al.
patent: 2003/0082483 (2003-05-01), Hohle et al.
patent: 1020767 (2000-07-01), None
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patent: WO 0110916 (2001-02-01), None
patent: WO 0204532 (2002-01-01), None
XP002208775 Chemical Abstract, vol. 133, No. 7, Aug. 14, 2000, Columbus, Ohio, Abstract No. 96786, K. Kodama et al. “Positive-Working Photosensitive Composition Containing Lactone Methacrylate Copolymer”.
Introduction to Microlithography, Second Edition by L. F. Thompson, C.G. Wilson, and M. J. Bowden, American Chemical Society, Washington, DC 1994, pp. 139-267.
Feiring Andrew E.
Petrov Viacheslav Alexandrovich
Schadt, III Frank L.
E.I. du Pont de Nemours and Company
Hamilton Cynthia
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