Projection type exposure apparatus

Details Projection type exposure apparatus Projection type exposure apparatus

1986-09-15

1989-01-03

Anderson, Bruce C.

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

250548, G01B 1100

Patent

active

047952440

ABSTRACT:
A projection type exposure apparatus for projecting an image of a pattern formed on a reticle onto a wafer in which the exposure is carried out with first light and the alignment between reticle and wafer is carried out with a second light having a wavelength different from that of the first light. The apparatus includes an optical member disposed between alignment optical system and projection optical system for reflecting the first light and transmitting the second light.

REFERENCES:
patent: 4422703 (1983-12-01), Kleinknecht
patent: 4498762 (1985-02-01), Uehara et al.
patent: 4616130 (1986-10-01), Omuta
patent: 4685807 (1987-08-01), Picard

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